First Stop of the National Roadshow on Newly Revised Intellectual Property Laws and Regulations Launched in Xi'an

Time:2026-08-28

Source:China National Intellectual Property Administration (CNIPA) Bureau News

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Type:Trademark;Patent;Other


Jurisdiction:China

Publication Date:2026-08-28

Technical Field:{{fyxType}}

On 25 August, the first stop of the national roadshow on the publicity and implementation of the newly revised intellectual property laws and regulations was officially launched in Xi'an, Shaanxi Province. The event was hosted by the China National Intellectual Property Administration and organized by the Shaanxi Provincial Intellectual Property Office, with Rui Wenbiao, member of the CPC Leadership Group and Deputy Commissioner of the CNIPA, attending and delivering an address.

Rui Wenbiao said that building the rule of law in intellectual property is foundational and safeguarding work for building China into an intellectual property powerhouse. Since the beginning of this year, the Trademark Law of the People's Republic of China, the Regulations on the Protection of Integrated Circuit Layout Designs and the Measures for the Administration of Prioritized Examination of Patents have been revised one after another. Focusing on resolving prominent pain points in current practice while consolidating the institutional foundation for the long term, these revisions are of great significance for promoting the high-quality development of intellectual property work. Efforts should continue to publicize and implement the newly revised laws, regulations and rules, and to steadily raise the level of law-based governance of intellectual property.

The event was held both onsite and online. More than 200 people from Shaanxi, Gansu, Qinghai and Ningxia attended in person, and nearly 20,000 people nationwide watched the live stream.

Source: China National Intellectual Property Administration (CNIPA) Bureau News Date of original: 26 August 2026 Original link: https://www.cnipa.gov.cn/art/2026/8/26/art_53_207863.html